Maskless Lithography tool


This system (DL-1000) utilizes a telecentric optics illumination system and a digital micromirror device (DMD) to perform immediate exposure onto photo resist of pattern data as desired, which is designed on a PC screen, without using Photomask.
This allows easy and accurate overlay alignment compare to separate optic path observation system.

DMD as high resolution pattern generator with ultra-fast mirror switching speed, DL-1000 is able to pattern your microstructures easily and fast.

DL-1000 is equipped CCD cameras and able to observe substrate coaxially to exposure optic path. This allows and easy, accurate and alignment compare to separate optic path observation system.


  • 1um resolution(0.5um or 2um resolution are the option)
  • Both Scanning and Step & Repeat mode are available
  • Maintenance Free System by the use of Long Life Light Source (LED or semiconductor Laser)
  • High Speed patterning speed > 2000mm 2/min (Laser Light Source)
  • Our smart real-time Auto Focus able to pattern even on the thin-transparent substrate, patterned substrate, and warped substrate
  • Simultaneous observation of surface pattern and exposure pattern by coaxial observation system, TTL(Through The Lens) and it allows high accuracy overlay with our own image processing technology.
  • Data convertor for DXF and GDSII is available.
  • Gray Scale Image can be exposed for 3D structuring
  • Down to 12.5nm address grid unit
  • Wide range of substrate Size: few mm up to metric size


  • Photo semiconductor device development
  • Development of communications devices
  • Development of light-curing materials
  • Micro ID numbering
  • MEMS
  • Bio, Life science, complex chemistry (Micro TAS, Microfluidics)
  • Localized exposure and selective exposure applications, etc.
  • Mix & Match with Ebeam Lithography
  • Industrial field
    (reticle and photomask production, micro mold, compound semiconductor fabrication, etc.)