We are pleased to announce the launch of a new Maskless Lithography system, DL-2500i.<\/p>\n
The DL-2500i offers dramatically improved performance compared to conventional systems and incorporates state-of-the-art technology.<\/p>\n
The main features of the DL-2500i are as follows.<\/p>\n
<Adoption of a new DMD>
\nThe DL-2500i adopts a new DMD (digital micromirror device) and has completely renewed its optical system. This enables high precision and stable performance to support customers’ prototyping and production processes.
\nImproved Throughput
\nThe throughput of the DL-2500i is more than 4 times higher than our previous device. This significantly improves production efficiency, and is expected to reduce costs and shorten delivery times.<\/p>\n
<i-line support>
\nThe DL-2500i is now i-line compatible, enabling it to be used for a wider range of applications. This allows us to meet a wide variety of needs.<\/p>\n
<Grayscale function is available>
\nThe grayscale function is available in the same way as the previous tool. High-precision grayscale exposure enables accurate exposure of even the smallest details.<\/p>\n
<\/p>\n
The DL-2500i is a new system developed using state-of-the-art technology to support innovation in prototyping and manufacturing processes.
\nPlease contact us for more detailed specifications and requests for a demonstration.<\/p>\n