{"id":7,"date":"2017-10-17T12:40:02","date_gmt":"2017-10-17T03:40:02","guid":{"rendered":"http:\/\/www.nanosystem-solutions.com\/en\/admin\/?page_id=7"},"modified":"2021-03-23T15:37:11","modified_gmt":"2021-03-23T06:37:11","slug":"maskless","status":"publish","type":"page","link":"https:\/\/www.nanosystem-solutions.com\/en\/product\/maskless","title":{"rendered":"Maskless Lithography tool"},"content":{"rendered":"<h2>Maskless Lithography tool<\/h2>\n<h4>Outline<\/h4>\n<p><img decoding=\"async\" class=\"alignleft\" src=\"\/en\/admin\/wp-content\/themes\/2017.10_en\/images\/product_maskless_img_01.jpg\" alt=\"\" \/><\/p>\n<p>This system (DL-1000) utilizes a telecentric optics illumination system and a digital micromirror device (DMD) to perform immediate exposure onto photo resist of pattern data as desired, which is designed on a PC screen, without using Photomask.<br \/>\nThis allows easy and accurate overlay alignment compare to separate optic path observation system.<\/p>\n<p class=\"reset\"><img decoding=\"async\" class=\"alignleft\" src=\"\/en\/admin\/wp-content\/themes\/2017.10_en\/images\/product_maskless_img_02.jpg\" alt=\"\" \/><\/p>\n<p>DMD as high resolution pattern generator with ultra-fast mirror switching speed, DL-1000 is able to pattern your microstructures easily and fast.<\/p>\n<p class=\"reset\"><img decoding=\"async\" class=\"alignleft\" src=\"\/en\/admin\/wp-content\/themes\/2017.10_en\/images\/product_maskless_img_03.jpg\" alt=\"\" \/><\/p>\n<p>DL-1000 is equipped CCD cameras and able to observe substrate coaxially to exposure optic path. This allows and easy, accurate and alignment compare to separate optic path observation system.<\/p>\n<h4>Features<\/h4>\n<ul class=\"check\">\n<li>1um resolution(0.5um or 2um resolution are the option)<\/li>\n<li>Both Scanning and Step &amp; Repeat mode are available<\/li>\n<li>Maintenance Free System by the use of Long Life Light Source (LED or semiconductor Laser)<\/li>\n<li>High Speed patterning speed &gt; 2000mm 2\/min (Laser Light Source)<\/li>\n<li>Our smart real-time Auto Focus able to pattern even on the thin-transparent substrate, patterned substrate, and warped substrate<\/li>\n<li>Simultaneous observation of surface pattern and exposure pattern by coaxial observation system, TTL(Through The Lens) and it allows high accuracy overlay with our own image processing technology.<\/li>\n<li>Data convertor for DXF and GDSII is available.<\/li>\n<li>Gray Scale Image can be exposed for 3D structuring<\/li>\n<li>Down to 12.5nm address grid unit<\/li>\n<li>Wide range of substrate Size: few mm up to metric size<\/li>\n<\/ul>\n<h4>Applications<\/h4>\n<ul class=\"check\">\n<li>Photo semiconductor device development<\/li>\n<li>Development of communications devices<\/li>\n<li>Development of light-curing materials<\/li>\n<li>Micro ID numbering<\/li>\n<li>MEMS<\/li>\n<li>Bio, Life science, complex chemistry (Micro TAS, Microfluidics)<\/li>\n<li>Localized exposure and selective exposure applications, etc.<\/li>\n<li>Mix &amp; Match with Ebeam Lithography<\/li>\n<li>Industrial field<br \/>\n(reticle and photomask production, micro mold, compound semiconductor fabrication, etc.)<\/li>\n<\/ul>\n","protected":false},"excerpt":{"rendered":"<p>Maskless Lithography tool Outline This system (DL-1000) utilizes a telecentric optics illumination system and  [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":6,"menu_order":1,"comment_status":"closed","ping_status":"closed","template":"page-col2.php","meta":{"_monsterinsights_skip_tracking":false,"_monsterinsights_sitenote_active":false,"_monsterinsights_sitenote_note":"","_monsterinsights_sitenote_category":0,"footnotes":""},"class_list":["post-7","page","type-page","status-publish","hentry"],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.nanosystem-solutions.com\/en\/wp-json\/wp\/v2\/pages\/7","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.nanosystem-solutions.com\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.nanosystem-solutions.com\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.nanosystem-solutions.com\/en\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.nanosystem-solutions.com\/en\/wp-json\/wp\/v2\/comments?post=7"}],"version-history":[{"count":0,"href":"https:\/\/www.nanosystem-solutions.com\/en\/wp-json\/wp\/v2\/pages\/7\/revisions"}],"up":[{"embeddable":true,"href":"https:\/\/www.nanosystem-solutions.com\/en\/wp-json\/wp\/v2\/pages\/6"}],"wp:attachment":[{"href":"https:\/\/www.nanosystem-solutions.com\/en\/wp-json\/wp\/v2\/media?parent=7"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}